Research on GaN-based light-emitting high electron mobility transistors with an embedded metal-insulator-semiconductor gate structure and their application in 2T1C active pixel circuits
OM images of the integrated 2T1C pixel circuit using p-GaN/AlGaN HEMT and LE-HEMT: (a) 2T1C device layout; (b) Operation at Vdata = 0V with LE-HEMT turned off; (c) Operation at Vdata = 2V with LE-HEMT turned on.
Sustainable Development Goals
Abstract/Objectives
This study investigates a 2T1C active-matrix pixel circuit composed of the GaN-based High Electron Mobility Transistor (HEMT) and Light-Emitting High Electron Mobility Transistor. Compared to the traditional thin-film transistor used in pixel circuits, HEMT features high electron mobility and high current density, which can effectively enhance the light output power and the refresh rate of display. Two different types of enhancement-mode transistors were studied as the driving transistors. The first is a P-GaN gate structure, which features simple fabrication and stable operation; the second is a recessed metal–insulator–semiconductor (MIS) gate structure, which effectively suppresses the off-state current and improves the voltage retention capability of the storage capacitor. Ultimately, this work successfully verifies that both structures can serve as robust driving circuits for 2T1C pixels, demonstrating great potential for the development of high-performance GaN-based display technologies.
Results/Contributions
In this work, experimental results demonstrate both pixel circuits exhibit stable switching performance and controllable luminance. In particular, the recessed MIS gate structure shows excellent voltage-holding characteristics. When the capacitor charging time is 200 ms, the capacitor can maintain the gate voltage of the driving transistor for 85.3 ms; even when the charging time is reduced to 500 µs, the gate voltage of the driving transistor is retained for more than 10 ms. These results confirm that the proposed pixel circuit can sustain the capacitor voltage for one frame period (approximately 8.33 ms), indicating its feasibility for 120-Hz high-frame-rate display applications.
Keywords
Gallium NitrideHigh Electron Mobility TransistorActive Pixel CircuitEnhancing TransistorP-type Gallium NitrideRecessed Metal-Insulator-SemiconductorCapacitanceVoltage Holding CharacteristicsHigh Frame Rate Display