A nonstoichiometric Sn37Mn10Ni53Ox thin film was synthesized successfully by thermal evaporator. The as-deposited Sn37Mn10Ni53Ox thin film demonstrated with higher absorption at 400 - 800 nm visible light regions, especially near 400 nm and an absorption coefficient of 1.15 x 106 cm−1. The PL spectra also revealed a peak intensity at 445 nm (~ 2.78 eV). The sandwich structure of p+-Si/Sn37Mn10Ni53Ox thin film/ITO photosensor device with post-annealing at 200 °C in Ar was fabricated. It exhibited a superior responsivity (Rres) of 11.5 A/W at 460 nm and a fast time response of photocurrent (tr = 41.2 ms, tf = 41.6 ms) at 1.0 V bias voltage. The fast photo response was suspected to be attributed to the variation of junction barrier height upon light on-and-off. The unique optoelectronic properties of the Sn37Mn10Ni53Ox thin film and its superior photosensor characteristics including responsivity and time response hold the potential for future photodetection applications.
(source: https://www.sciencedirect.com/science/article/abs/pii/S0921510721000866)
Chia-Tung Kuo, Yu-Ying Chu, Han-Yi Chen, and Tri-Rung Yew*, Tin-Manganese-Nickel Oxide Thin Films Prepared by Thermal Evaporation for Photosensor Applications, Materials Science and Engineering: B, 2021, 268C, 115126, 1–8.